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| 蓝宝石晶体与N–BK7玻璃的高温界面黏着 |
| Interfacial Adhesion between Sapphire Crystal and N-BK7 Glass at Elevated Temperatures |
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| DOI：10.3969/j.issn.1674-6457.2023.03.024 |
| 中文关键词: 蓝宝石晶体 N‒BK7玻璃 热压 界面黏着 正交试验 |
| 英文关键词: sapphire crystal N-BK7 glass hot pressing interfacial adhesion orthogonal test |
| 基金项目:深港创新圈联合研发项目(SGDX20190919094403772);深圳市人才和载体专项(ZDSYS20200811143757023);深圳市高等院校稳定支持计划面上项目(20220809172552003);深圳大学青年教师科研启动项目(000002111214) |
| Author Name | Affiliation | | ZHU You-cheng | College of Mechatronics and Control Engineering, Guangdong Shenzhen 518060, China
Shenzhen Key Laboratory of High Performance Nontraditional Manufacturing, Shenzhen University, Guangdong Shenzhen 518060, China | | YANG Gao | College of Mechatronics and Control Engineering, Guangdong Shenzhen 518060, China
Shenzhen Key Laboratory of High Performance Nontraditional Manufacturing, Shenzhen University, Guangdong Shenzhen 518060, China | | GONG Feng | College of Mechatronics and Control Engineering, Guangdong Shenzhen 518060, China
Shenzhen Key Laboratory of High Performance Nontraditional Manufacturing, Shenzhen University, Guangdong Shenzhen 518060, China |
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| 中文摘要: |
| 目的 评估蓝宝石晶体作为玻璃热压模具的可行性。方法 通过系统地开展玻璃热压试验，获知蓝宝石晶体与N–BK7玻璃在不同热压温度、载荷、保温时间条件下的界面黏着状况，并初步探究蓝宝石晶体晶向的影响。使用CCD相机、金相显微镜和场发射扫描电子显微镜(SEM)对热压试验后的蓝宝石晶体模具表面形貌进行表征，运用能量色散X射线光谱(EDS)对模具表面黏着物质的成分进行分析。结果 热压温度是蓝宝石晶体与N–BK7玻璃界面黏着最主要的影响因素;在热压温度600~700 ℃、保温时间3~25 min、载荷0~1 000g的条件范围内存在不发生黏着的区域边界;在不同的条件下，蓝宝石晶体表面的黏着残留物分布也有所不同。通过选取合适的工艺参数，蓝宝石晶体在600 ℃以上时与N–BK7玻璃表现出较好的抗黏着性，体现了其在玻璃微纳热压印模具领域的潜在应用。结论 详细揭示了蓝宝石晶体与N–BK7玻璃在不同热压温度、保温时间、载荷下的界面黏着状况，并且成功地将蓝宝石晶体模具表面的微结构复制到了N–BK7玻璃上，为蓝宝石晶体用于玻璃微纳热压印模具提供了试验依据。 |
| 英文摘要: |
| The work aims to evaluate the feasibility of using sapphire crystal as a hot pressing mold for glass. By systematically carrying out glass hot pressing tests, the interfacial adhesion of sapphire crystal and N-BK7 glass under different hot pressing temperature, load and holding time was obtained, and the effects of crystal orientation on sapphire crystal were preliminarily explored.The surface morphology of sapphire crystal mold after hot pressing tests was characterized with CCD camera, metallographic microscope and field emission scanning electron microscope (SEM), and the chemical composition of the residue on the sapphire crystal mold was analyzed with Energy Dispersive X-ray Spectroscopy (EDS). The results showed that hot pressing temperature was the most significant factor affecting the interfacial adhesion between sapphire crystal and N-BK7 glass. Nevertheless, there was a non-adhesive boundary under a hot pressing temperature of 600-700 ℃, a holding time of 3-25 min and a mechanical load of 0-1 000 g. The distribution of residue on the surface of sapphire crystal varied under different hot pressing conditions. By selecting appropriate parameters, the sapphire crystal exhibited satisfactory adhesion resistance to N-BK7 glass above 600 ℃, which rendered its potential application in glass thermal nanoimprinting molds. This article reveals in detail the adhesion resistance of sapphire crystal to N-BK7 glass under different hot pressing temperature, holding time, and load. Furthermore, micro patterns on the sapphire crystal are thermally imprinted on the surface of the N-BK7 glass, which experimentally validates the rationality of using sapphire crystal as the glass thermal nanoimprinting mold. |
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